{"created":"2024-10-28T02:59:17.886480+00:00","id":2004225,"links":{},"metadata":{"_buckets":{"deposit":"c42db5f5-c679-4fb2-9e54-425381c2749e"},"_deposit":{"created_by":7,"id":"2004225","owners":[7],"pid":{"revision_id":0,"type":"depid","value":"2004225"},"status":"published"},"_oai":{"id":"oai:tokushima-u.repo.nii.ac.jp:02004225","sets":["1713829974766:1713854680413:1716363992866","1713853213384:1713853297799"]},"author_link":["420"],"item_10001_alternative_title_1":{"attribute_name":"タイトル別表記","attribute_value_mlt":[{"subitem_alternative_title":"Study on Fabrication Method of High Quality Graphene","subitem_alternative_title_language":"en"}]},"item_10001_biblio_info_7":{"attribute_name":"書誌情報","attribute_value_mlt":[{"bibliographicIssueDates":{"bibliographicIssueDate":"2015","bibliographicIssueDateType":"Issued"},"bibliographicPageEnd":"10","bibliographicPageStart":"1","bibliographicVolumeNumber":"60","bibliographic_titles":[{"bibliographic_title":"大学院ソシオテクノサイエンス研究部研究報告","bibliographic_titleLang":"ja"},{"bibliographic_title":"Bulletin of Institute of Technology and Science","bibliographic_titleLang":"en"}]}]},"item_10001_description_5":{"attribute_name":"抄録","attribute_value_mlt":[{"subitem_description":"This report describes formation and evaluation techniques of high-quality graphene on silicon carbide (SiC) for new functional devices. Epitaxial graphene on SiC substrates is one of the most promising candidates for wafer-scale graphene. Large area graphene with minimal roughness was successfully fabricated using infrared rapid thermal annealing. A surface structure control technique was established to create a uniform single-crystal monolayer of graphene on a SiC substrate. Graphene nanoproperties were measured using scanning probe microscopy (SPM) such as friction force microscopy (FFM) and Kelvin force microscopy (KFM). Graphene electrical properties, such as anisotropy of mobility and graphene-graphene contact system are also discussed.  ","subitem_description_language":"en","subitem_description_type":"Abstract"}]},"item_10001_rights_15":{"attribute_name":"権利情報","attribute_value_mlt":[{"subitem_rights":"この論文の著作権は徳島大学ソシオテクノサイエンス研究部にあります。","subitem_rights_language":"ja"}]},"item_10001_source_id_9":{"attribute_name":"収録物ID","attribute_value_mlt":[{"subitem_source_identifier":"21859094","subitem_source_identifier_type":"ISSN"},{"subitem_source_identifier":"AA12214889","subitem_source_identifier_type":"NCID"}]},"item_10001_version_type_20":{"attribute_name":"出版タイプ","attribute_value_mlt":[{"subitem_version_resource":"http://purl.org/coar/version/c_970fb48d4fbd8a85","subitem_version_type":"VoR"}]},"item_1715043197608":{"attribute_name":"アクセス権","attribute_value_mlt":[{"subitem_access_right":"open access"}]},"item_1723180141928":{"attribute_name":"EID","attribute_value_mlt":[{"subitem_identifier_type":"URI","subitem_identifier_uri":"307337"}]},"item_creator":{"attribute_name":"著者","attribute_type":"creator","attribute_value_mlt":[{"creatorNames":[{"creatorName":"永瀬, 雅夫","creatorNameLang":"ja"}],"nameIdentifiers":[{"nameIdentifier":"420","nameIdentifierScheme":"WEKO"}]}]},"item_files":{"attribute_name":"ファイル情報","attribute_type":"file","attribute_value_mlt":[{"accessrole":"open_access","date":[{"dateType":"Available","dateValue":"2018-02-08"}],"displaytype":"detail","filename":"bits_60_1.pdf","filesize":[{"value":"1.61 MB"}],"format":"application/pdf","mimetype":"application/pdf","url":{"objectType":"fulltext","url":"https://tokushima-u.repo.nii.ac.jp/record/2004225/files/bits_60_1.pdf"},"version_id":"2e890679-7a34-4357-bc08-bfea2d42ac29"}]},"item_keyword":{"attribute_name":"キーワード","attribute_value_mlt":[{"subitem_subject":"Graphene","subitem_subject_language":"en","subitem_subject_scheme":"Other"},{"subitem_subject":"SiC","subitem_subject_language":"en","subitem_subject_scheme":"Other"},{"subitem_subject":"Rapid infrared thermal annealing","subitem_subject_language":"en","subitem_subject_scheme":"Other"},{"subitem_subject":"Scanning probe microscopy","subitem_subject_language":"en","subitem_subject_scheme":"Other"},{"subitem_subject":"van der Pauw method","subitem_subject_language":"en","subitem_subject_scheme":"Other"}]},"item_language":{"attribute_name":"言語","attribute_value_mlt":[{"subitem_language":"jpn"}]},"item_resource_type":{"attribute_name":"資源タイプ","attribute_value_mlt":[{"resourcetype":"departmental bulletin paper","resourceuri":"http://purl.org/coar/resource_type/c_6501"}]},"item_title":"高品質グラフェン作製技術の研究","item_titles":{"attribute_name":"タイトル","attribute_value_mlt":[{"subitem_title":"高品質グラフェン作製技術の研究","subitem_title_language":"ja"}]},"item_type_id":"40001","owner":"7","path":["1713853297799","1716363992866"],"pubdate":{"attribute_name":"PubDate","attribute_value":"2018-02-08"},"publish_date":"2018-02-08","publish_status":"0","recid":"2004225","relation_version_is_last":true,"title":["高品質グラフェン作製技術の研究"],"weko_creator_id":"7","weko_shared_id":-1},"updated":"2024-10-28T02:59:26.834478+00:00"}