{"created":"2024-10-29T01:17:09.591991+00:00","id":2007015,"links":{},"metadata":{"_buckets":{"deposit":"fa4d0f14-3c9e-4743-b698-83d291060655"},"_deposit":{"created_by":7,"id":"2007015","owners":[7],"pid":{"revision_id":0,"type":"depid","value":"2007015"},"status":"published"},"_oai":{"id":"oai:tokushima-u.repo.nii.ac.jp:02007015","sets":["1713853213384:1713853295607"]},"author_link":["50","51"],"item_10001_biblio_info_7":{"attribute_name":"書誌情報","attribute_value_mlt":[{"bibliographicIssueDates":{"bibliographicIssueDate":"2019-10-31","bibliographicIssueDateType":"Issued"},"bibliographicIssueNumber":"6","bibliographicPageStart":"062919","bibliographicVolumeNumber":"37","bibliographic_titles":[{"bibliographic_title":"Journal of Vacuum Science & Technology B","bibliographic_titleLang":"en"}]}]},"item_10001_description_5":{"attribute_name":"抄録","attribute_value_mlt":[{"subitem_description":"In this work, the authors propose and verify a method of measuring the residual stress of {112}-oriented chromium nitride (CrN) layers in CrN/Cr multilayer thin films. The CrN layers of a CrN/Cr multilayer film deposited on a Ti6Al4V substrate by arc ion plating form both a randomly oriented mixed crystal structure and a {112}-oriented structure. Therefore, accurate stress measurement of the CrN layers cannot be performed by applying the sin2ψ x-ray method assuming an isotropic homogeneous material. To overcome this obstacle, the proposed method to measure the residual stress uses four CrN-422 diffractions: at ψ = 0°, 33.56°, 48.19°, and 60.00°. Next, the authors vary the density of Cr droplets on the film surface to evaluate how it affects the residual stress in the CrN/Cr multilayer film. The results indicate that the Cr layer has a residual compressive stress of −350 to −530 MPa and that the two CrN layers have a very large residual compressive stress of −3.5 to −8.2 GPa. In addition, both residual compressive stresses decrease with increasing droplet density.","subitem_description_language":"en","subitem_description_type":"Abstract"}]},"item_10001_publisher_8":{"attribute_name":"出版者","attribute_value_mlt":[{"subitem_publisher":"American Vacuum Society","subitem_publisher_language":"en"}]},"item_10001_source_id_9":{"attribute_name":"収録物ID","attribute_value_mlt":[{"subitem_source_identifier":"21662746","subitem_source_identifier_type":"ISSN"},{"subitem_source_identifier":"21662754","subitem_source_identifier_type":"ISSN"},{"subitem_source_identifier":"AA10804928","subitem_source_identifier_type":"NCID"}]},"item_10001_version_type_20":{"attribute_name":"出版タイプ","attribute_value_mlt":[{"subitem_version_resource":"http://purl.org/coar/version/c_970fb48d4fbd8a85","subitem_version_type":"VoR"}]},"item_1715043197608":{"attribute_name":"アクセス権","attribute_value_mlt":[{"subitem_access_right":"open access"}]},"item_1718868208704":{"attribute_name":"備考","attribute_value_mlt":[{"subitem_textarea_language":"ja","subitem_textarea_value":"This article may be downloaded for personal use only. Any other use requires prior permission of the author and AIP Publishing. This article appeared in Journal of Vacuum Science & Technology B 37, 062919 (2019) and may be found at https://doi.org/10.1116/1.5118682.\nThis paper is part of the Conference Collection: 15th International Symposium on Sputtering and Plasma Processes (ISSP2019)."}]},"item_1722929371688":{"attribute_name":"出版社版DOI","attribute_value_mlt":[{"subitem_relation_name":[{"subitem_relation_name_language":"ja","subitem_relation_name_text":"10.1116/1.5118682"}],"subitem_relation_type_id":{"subitem_relation_type_id_text":"https://doi.org/10.1116/1.5118682","subitem_relation_type_select":"DOI"}}]},"item_1723180141928":{"attribute_name":"EID","attribute_value_mlt":[{"subitem_identifier_type":"URI","subitem_identifier_uri":"360900"}]},"item_creator":{"attribute_name":"著者","attribute_type":"creator","attribute_value_mlt":[{"creatorAffiliations":[{"affiliationNameIdentifiers":[{"affiliationNameIdentifier":"","affiliationNameIdentifierScheme":"ISNI","affiliationNameIdentifierURI":"http://www.isni.org/isni/"}],"affiliationNames":[{"affiliationName":"","affiliationNameLang":"ja"}]}],"creatorNames":[{"creatorName":"日下, 一也","creatorNameLang":"ja"},{"creatorName":"クサカ, カズヤ","creatorNameLang":"ja-Kana"},{"creatorName":"Kusaka, Kazuya","creatorNameLang":"en"}],"familyNames":[{"familyName":"日下","familyNameLang":"ja"},{"familyName":"クサカ","familyNameLang":"ja-Kana"},{"familyName":"Kusaka","familyNameLang":"en"}],"givenNames":[{"givenName":"一也","givenNameLang":"ja"},{"givenName":"カズヤ","givenNameLang":"ja-Kana"},{"givenName":"Kazuya","givenNameLang":"en"}],"nameIdentifiers":[{"nameIdentifier":"50","nameIdentifierScheme":"WEKO"},{"nameIdentifier":"10662/profile-ja.html","nameIdentifierScheme":"徳島大学 教育研究者総覧","nameIdentifierURI":"http://pub2.db.tokushima-u.ac.jp/ERD/person/10662/profile-ja.html"},{"nameIdentifier":"70274256","nameIdentifierScheme":"e-Rad","nameIdentifierURI":"https://nrid.nii.ac.jp/ja/search/?qm=70274256"}]},{"creatorNames":[{"creatorName":"シラサカ, ケンタ","creatorNameLang":"ja"},{"creatorName":"シラサカ, ケンタ","creatorNameLang":"ja-Kana"},{"creatorName":"Shirasaka, Kenta","creatorNameLang":"en"}]},{"creatorAffiliations":[{"affiliationNameIdentifiers":[{"affiliationNameIdentifier":"","affiliationNameIdentifierScheme":"ISNI","affiliationNameIdentifierURI":"http://www.isni.org/isni/"}],"affiliationNames":[{"affiliationName":"","affiliationNameLang":"ja"}]}],"creatorNames":[{"creatorName":"米倉, 大介","creatorNameLang":"ja"},{"creatorName":"ヨネクラ, ダイスケ","creatorNameLang":"ja-Kana"},{"creatorName":"Yonekura, Daisuke","creatorNameLang":"en"}],"familyNames":[{"familyName":"米倉","familyNameLang":"ja"},{"familyName":"ヨネクラ","familyNameLang":"ja-Kana"},{"familyName":"Yonekura","familyNameLang":"en"}],"givenNames":[{"givenName":"大介","givenNameLang":"ja"},{"givenName":"ダイスケ","givenNameLang":"ja-Kana"},{"givenName":"Daisuke","givenNameLang":"en"}],"nameIdentifiers":[{"nameIdentifier":"51","nameIdentifierScheme":"WEKO"},{"nameIdentifier":"10663/profile-ja.html","nameIdentifierScheme":"徳島大学 教育研究者総覧","nameIdentifierURI":"http://pub2.db.tokushima-u.ac.jp/ERD/person/10663/profile-ja.html"},{"nameIdentifier":"70314846","nameIdentifierScheme":"e-Rad","nameIdentifierURI":"https://nrid.nii.ac.jp/ja/search/?qm=70314846"}]},{"creatorNames":[{"creatorName":"タナカ, ユウタ","creatorNameLang":"ja"},{"creatorName":"タナカ, ユウタ","creatorNameLang":"ja-Kana"},{"creatorName":"Tanaka, Yuta","creatorNameLang":"en"}]}]},"item_files":{"attribute_name":"ファイル情報","attribute_type":"file","attribute_value_mlt":[{"accessrole":"open_access","date":[{"dateType":"Available","dateValue":"2020-10-31"}],"displaytype":"detail","filename":"jvstb_37_6_062919.pdf","filesize":[{"value":"1.62 MB"}],"format":"application/pdf","mimetype":"application/pdf","url":{"objectType":"fulltext","url":"https://tokushima-u.repo.nii.ac.jp/record/2007015/files/jvstb_37_6_062919.pdf"},"version_id":"0a2f29f0-4bcd-4481-9e3c-a24da3c1809d"}]},"item_language":{"attribute_name":"言語","attribute_value_mlt":[{"subitem_language":"eng"}]},"item_resource_type":{"attribute_name":"資源タイプ","attribute_value_mlt":[{"resourcetype":"journal article","resourceuri":"http://purl.org/coar/resource_type/c_6501"}]},"item_title":"Residual stress measurement of {112}-oriented CrN layers in CrN/Cr multilayer films","item_titles":{"attribute_name":"タイトル","attribute_value_mlt":[{"subitem_title":"Residual stress measurement of {112}-oriented CrN layers in CrN/Cr multilayer films","subitem_title_language":"en"}]},"item_type_id":"40001","owner":"7","path":["1713853295607"],"pubdate":{"attribute_name":"PubDate","attribute_value":"2019-12-23"},"publish_date":"2019-12-23","publish_status":"0","recid":"2007015","relation_version_is_last":true,"title":["Residual stress measurement of {112}-oriented CrN layers in CrN/Cr multilayer films"],"weko_creator_id":"7","weko_shared_id":-1},"updated":"2025-01-24T02:02:49.714991+00:00"}