{"created":"2024-12-12T09:32:03.751120+00:00","id":2010930,"links":{},"metadata":{"_buckets":{"deposit":"da388f2d-2a36-4500-83ea-ce81a8c3ee30"},"_deposit":{"created_by":7,"id":"2010930","owners":[7],"pid":{"revision_id":0,"type":"depid","value":"2010930"},"status":"published"},"_oai":{"id":"oai:tokushima-u.repo.nii.ac.jp:02010930","sets":["1713853213384:1713853295607"]},"author_link":["740","420"],"item_10001_biblio_info_7":{"attribute_name":"書誌情報","attribute_value_mlt":[{"bibliographicIssueDates":{"bibliographicIssueDate":"2023-03-20","bibliographicIssueDateType":"Issued"},"bibliographicIssueNumber":"SG","bibliographicPageStart":"SG1031","bibliographicVolumeNumber":"62","bibliographic_titles":[{"bibliographic_title":"Japanese Journal of Applied Physics","bibliographic_titleLang":"en"}]}]},"item_10001_description_5":{"attribute_name":"抄録","attribute_value_mlt":[{"subitem_description":"In this study, stacked graphene diodes were fabricated via direct bonding using single-crystal graphene on a SiC substrate. Switching and S-shaped negative resistance were observed in the junction electrical properties measured via the 4-terminal configuration. The high-resistance state switched to the low-resistance state after applying a maximum junction voltage of ~10 V. In the high-bias voltage region, the junction voltage decreased from the maximum junction voltage to a few volts, indicating a negative resistance. In the high-resistance state, junction conductance was nearly constant at 0.13 mS. Electrical conductance in the high-bias region was expressed using an exponential function with an exponent of −1.26. Therefore, the fabricated stacked graphene diode with a simple device structure demonstrated strong nonlinear electrical properties with negative differential conductance.","subitem_description_language":"en","subitem_description_type":"Abstract"}]},"item_10001_publisher_8":{"attribute_name":"出版者","attribute_value_mlt":[{"subitem_publisher":"The Japan Society of Applied Physics","subitem_publisher_language":"en"},{"subitem_publisher":"IOP Publishing","subitem_publisher_language":"en"}]},"item_10001_rights_15":{"attribute_name":"権利情報","attribute_value_mlt":[{"subitem_rights":"This is the Accepted Manuscript version of an article accepted for publication in Japanese Journal of Applied Physics. IOP Publishing Ltd is not responsible for any errors or omissions in this version of the manuscript or any version derived from it. The Version of Record is available online at 10.35848/1347-4065/acbbd4.","subitem_rights_language":"en"}]},"item_10001_source_id_9":{"attribute_name":"収録物ID","attribute_value_mlt":[{"subitem_source_identifier":"00214922","subitem_source_identifier_type":"ISSN"},{"subitem_source_identifier":"13474065","subitem_source_identifier_type":"ISSN"},{"subitem_source_identifier":"AA12295836","subitem_source_identifier_type":"NCID"}]},"item_10001_version_type_20":{"attribute_name":"出版タイプ","attribute_value_mlt":[{"subitem_version_resource":"http://purl.org/coar/version/c_ab4af688f83e57aa","subitem_version_type":"AM"}]},"item_1715043197608":{"attribute_name":"アクセス権","attribute_value_mlt":[{"subitem_access_right":"open 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